ICCG 9

Please visit us at booth 19, 1. Floor. We are looking forward to meeting you!

Presentation
Deposition Technologies 1: Pulsed Plasma and Ion Sources in Vacuum

Dr. N. Schiller
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP

»Vacuum roll-to-roll technologies for transparent barriers on polymer webs«

25.06., 15:30 Uhr

Presentation
Deposition Technologies 3: CVD, ALD and other emerging processes

Dr. S. Günther
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP

»High rate low pressure PECVD for barrier and optical coatings«

26.06., 15:10 Uhr

Presentation
Key Technologies for Displays, Touch Panels and Flexible Electronics

Dr. H. Bartzsch
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP

»Low damage magnetron sputtering of TCO films«

27.06., 9:30 Uhr

Presentation
N.N.

Dr. M. Junghähnel
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP

»High deposition rate sputtering of titania and zinc oxide based TCOs on large areas«

Datum, Uhrzeit (t.b.a.)

Poster
Technical Session 7
Solar, Architectural, Automotive and Other Applications

T. Preußner
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP

»Nb2O5 and TiO2 thin films deposited by pulse magnetron sputtering of cylindrical ceramic targets«