In thin-film technology, heat treatment – also referred to as annealing – is often used to selectively improve material properties of thin films, such as their crystallinity or density, and hence their electrical and optical properties. However, these are energy-intensive as well as time-intensive techniques, associated with large facility footprints. That makes their applicability for large-area substrate formats difficult or even impossible. Flash lamp annealing (FLA) offers a smart solution to this problem. In cooperation between ROVAK GmbH and the Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP this technology has been studied and further developed for large-area applications as part of the project InnoFlash funded by the Saxony State Ministry of Economy, Labor and Transport (SMWA, project number 100349243/3698).more info
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