LB nano

Ultra-pure nanoparticles, sputter and PECVD nanocomposite co-deposition setup

Introduction

The LB nano platform combines nanoparticles (NPs) synthesis and matrix deposition in a single vacuum vessel, enabling the production of Safe and sustainable by design (SSbD) nanocomposite coatings that cannot be achieved by wet-chemistry routes.

Metal NPs of 2 – 50 nm diameter and purity ≥ 99.999% are synthesised ligand-free and embedded into functional matrix layers (oxide, polymer, or hybrid) without any liquid, solvent, or organic contaminant.

The result is a class of nanocomposite thin films with tunable optical, catalytic, electrical, and antibacterial properties on large substrates, including flexible webs and thermally sensitive foils.

Established accademic and industrial partner-ships make LB nano the reference platform in Europe for gas-aggregation nanocomposite research and scale-up.

Applications

Sensing and Detection

  • Flexible strain sensors
  • Plasmonic gas sensors

Sustainable Coatings & Packaging

  • Photocatalytic, easy to clean surfaces
  • High-barrier flexible packaging, pinhole-free plasma polymer coatings

Health and Antibacterial Surfaces

  • Antibacterial and antifouling layers on membranes for water treatment
  • Metal NPs for advanced cancer therapies and contrast agents

Photonics, Optics & Security

  • Plasmonic absorbers e. g. for sensing, optic and decorative applications
  • Photochromic security labels

Energy and Catalysis

  • PEM & AEM fuel-cell and electrolyser catalyst layers for HER reaction
  • Photothermal catalysis for NH3 cracking
SEM cross-section micrograph of multi-layer deposition with Ag-NPs and SiOx PECVD matrix
Deposition of Ag NPs SiOx nanocomposites over > 100 × 1250 mm (rotation mode)
TEM image of Pt NPs deposited by GFS with the LB nano system
μ-XRF homogeneity for Pt (rotation mode)
Schematic representation of the LB nano

Our offer

Synthesis of NPs

  • Deposition of plasma polymer layers
  • Deposition of multilayers and gradient layers with varying fill-factors

on a wide variety of possible substrates:

  • Flat substrates (340 × 100 mm)
  • Polymer foils (200 mm width)
  • Collection medium (Si, cellulose, PDMS)

Flexible choice of materials for the nanocomposite thin films deposition:

  • Inorganic NPs (metals, semiconductors, oxides, inorganic compounds)
  • Organic & inorganic matrix materials (plasma polymers, oxides, metals, amorphous layers)

Technologies

NP Source – PVD process

  • Gas Flow Sputtering of any solid metal
  • Reactive sputtering mode also possible

Matrix source – PECVD process

  • VHF source for the embedding of nanoparticles in ceramic (PECVD) or organic (plasma polymer) matrix layers
  • Monomer precursors: silicon or carbon-based compounds (i. e. Siloxane, Isoprene, fluorinated benzene)

Matrix source – PVD process

  • Magnetron Sputter source for the deposition from solid target material
  • Pulsed DC Reactive Sputter operation for the deposition of oxide and nitride matrix layers, HF sputtering possible

Safe and Sustainable by Design (SSbD)

  • Validated 3-tier NP-exposure protocol, documented NP concentrations and lung deposition modelling for usual materials
  • Most comprehensive GFS operator safety dataset in Europe, providing regulatory base required for SSbD compliance