Single substrate coating

We offer specialized coating processes for single substrates such as wafers and glass substrates that are specifically tailored to the requirements of modern microelectronics, optics and sensor technology.

Our technologies, including reactive pulse magnetron sputtering, magnetron PECVD and electron beam evaporation, enable the development of coatings with optical, electrical, acoustic, magnetic or corrosion-inhibiting properties.

Through the targeted control of substrate movement and precise in-situ monitoring, we can realize coating thicknesses and properties with high reproducibility and long-term stability. These processes ensure high efficiency and flexibility, making them ideal for customized solutions and complex coating requirements.

Whether for glass, wafers or other materials, our coatings set standards in quality and precision and offer a wide range of applications for various high-tech industries.

Fraunhofer FEP offers comprehensive expertise in process and technology development for coating technologies and layer systems according to your application along the entire value chain:

• Feasibility studies
• Development of the coating technology and coating system for your product
• Sample coatings
• Development of key assemblies
• Technology transfer to production
• Support with system realization for our customers
• Licensing

This development work is supplemented and supported by

• Acquisition and coordination of projects subsidized by the state, the federal government and the European Union
• Economic feasibility studies
• Studies on the state of the art, e.g. literature and patent research