Plasma surface technologies

Plasma-assisted coating processes enable the production of customized coatings for many areas of application. Our strength lies in qualifying these plasma-assisted coating processes for industrial production and the coating of large surfaces. The core competence includes the PVD processes of plasma-activated high-rate evaporation and pulse magnetron sputtering as well as PECVD processes for plasma-activated chemical vapour deposition with various high-performance plasma sources.

A unique selling point is the combination of extremely dense plasmas with extremely high deposition rates for the economical deposition of high-quality coatings. The combination of economic efficiency with precision in terms of process control and coating properties opens up new applications. For these coating processes, we also develop the cleaning processes and plasma pre-treatments required to ensure coating adhesion.

Fraunhofer FEP offers comprehensive expertise in process and technology development for coating technologies and layer systems according to your application along the entire value chain:

• Feasibility studies
• Development of the coating technology and coating system for your product
• Sample coatings
• Development of key assemblies
• Technology transfer to production
• Support with system realization for our customers
• Licensing

This development work is supplemented and supported by

• Acquisition and coordination of projects subsidized by the state, the federal government and the European Union
• Economic feasibility studies
• Studies on the state of the art, e.g. literature and patent research

Fraunhofer FEP has developed innovative methods for the efficient anti-reflective treatment of films. By utilizing a proven plasma etching process, which has already been tested in the production of small and compact optical components, continuous processing in a roll-to-roll process is now made possible.