Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP
Plant for plasma-activated electron beam evaporation
Vacuum coating plant with high-power electron beam (300 kW) for plasma-activated evaporation under scalable conditions
Typical substrate
- coating of sheets made of metal, plastic, glass or ceramics with maximum substrate dimensions of 120 mm × 200 mm
- coating of three-dimensional components
Range of applications
- technology development, in particular new plasma processes for high-power deposition and substrate pre-treatment
- development of new PVD layer systems
- fundamental studies on plasma-activated electron beam evaporation
- sample coatings