Plant for plasma-activated electron beam evaporation

Vacuum coating plant with high-power electron beam (300 kW) for plasma-activated evaporation under scalable conditions

Typical substrate

  • coating of sheets made of metal, plastic, glass or ceramics with maximum substrate dimensions of 120 mm × 200 mm
  • coating of three-dimensional components

Range of applications

  • technology development, in particular new plasma processes for high-power deposition and substrate pre-treatment
  • development of new PVD layer systems
  • fundamental studies on plasma-activated electron beam evaporation
  • sample coatings