In-line sputtering system for precision coating of large substrates using the following technologies:

  • pulsed sputtering
  • plasma pre-treatment

Typical substrates

  • Substrate size: 650 mm × 750 mm × 120 mm
  • rotating substrates: up to Ø 550 mm
  • substrate rotation: up to 20 Hz

Range of applications

  • Development and optimization of coating technologies and coating systems
  • Coating of samples and pilot productions
  • Development of key assemblies, such as magnetron sputter sources and plasma etchers